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  Liquid Crystals
OLED
Organic
Electronics
Photovoltaics
  isishape™ Portfolio
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Structuring Solutions for economical and environmentally- friendly processes for solar cell and display fabrication
Contact Us
EMD Chemicals
790 Memorial Drive, Suite 101
Cambridge, MA 02139

Business Development:
617-225-0690

Product Management/
Product Inquiries:
856-599-6613
800-222-0342 x56613

Email Us at:
liquidcrystals@
emdchemicals.com


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isishape SolarEtch 
isishape HiperEtch 

SolarEtch™ for PV Applications (SiO2, SiNx and Si Etching)
HiperEtch™ for Display Applications (ITO, IZO, Ag, AI Etching)


Screen Printable, Ink Jettable and Dispensible Etchants
These novel screen printable etching pastes enable large-scale production using off-the-shelf equipment in an efficient and environmentally-friendly way. Under the brand isishape™ Structuring Solutions, Merck KGaA has developed several paste types that are able to etch through various passivation layers selectively to create anti-reflection coatings or vias for solar cell fabrication. In addition, screen printable pastes for etching ITO and other transparent conductors for touch panel and electroluminescent lamp applications are available. Dispensible formulations have also been developed for etching silicon and transparent conductive materials. And, recently, an ink-jettable formulation has been developed for ITO removal.

With standard screen printing methods, high yields and high efficiency are readily achievable. In comparison to other removal techniques, such as Laser Ablation, Photolithography/Etch Resist and Plasma Etching, the Screen Printing of etching pastes is a high throughput process. Moreover, it can provide lower capital equipment costs and lower total cost of ownership relative to these other techniques.

The following isishape™ SolarEtch™ and HiperEtch™ products are commercially available.

- for your screen printing process:

   SolarEtch™ BES - for SiO2, SiNx
   SolarEtch™ BRS - for low temperature SiO2, SiNx etching
   SolarEtch™ SiS - for silicon etching
   HiperEtch™ O4S - for ITO on glass
   HiperEtch™ O9S - for ITO on plastic (polyester)
   HiperEtch™ O6S - for AI etching

- for your dispensing process:
   SolarEtch™ SiD - for silicon
   HiperEtch™ 01D - for ITO removal

Other formulations for selective etching of oxide or metallic thin films and for other printing techniques are available upon request.

Choose EMD as your partner for advanced materials and their application in photovoltaic and display manufacturing. EMD will develop new products according to your specific requirements in close cooperation with you.

For more detailed information on key benefits, properties, processing guidelines, paste removal, package sizes and safety data, please contact us.

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